HOKKAIDO INTERNATIONAL FOUNDATION

PROGRAM DATES
June 8, 2023 - August 5, 2023 (8 weeks)


ELIGIBLE APPLICANTS
1. Applicants should be enrolled at an institution of higher education in an undergraduate, graduate or postgraduate course. Professionals or graduates with at least a bachelor's degree are invited to apply.

2. Applicants should have studied at least the elementary level of Japanese (e.g., completed the textbooks "Genki 1" AND "Genki 2") at any appropriate institutions, and have attained a proficiency of Intermediate-Low or higher as outlined in the ACTFL proficiency guidelines.

3. Applicants should be willing to abide by the program's regulations. They should also be able and willing to adapt to new situations with social and cross-cultural sensitivity.

4. Applicants should be able to participate in the program for the full duration and be committed to an intensive Japanese language and Japanese culture study program.


COURSES OFFERED
Two or three levels from the following will be offered.

<CLASS C> Main textbook: Oka, et al., Tobira: Gateway to Advanced Japanese, Kurosio Publishers, 8-9 lessons (excerpted) from Lessons 1-9

<CLASS D> Main textbook: Oka, et al., Tobira: Gateway to Advanced Japanese, Kurosio Publishers, 8-10 lessons (excerpted) from Lessons 6-15

<CLASS E> Main materials: Kamada, et al., Authentic Japanese: Progressing from Intermediate to Advanced (New Edition), The Japan Times, 6 lessons (excerpted), movies, TV dramas, newspaper articles, short novels, etc.

<CLASS F> Main materials: Kamada, et al., Authentic Japanese: Progressing from Intermediate to Advanced (New Edition), The Japan Times, 6 lessons (excerpted), movies, TV dramas, newspaper articles, short novels, etc.


NUMBER OF STUDENTS WE ACCEPT
20-30 students


APPLICATION PERIOD
From the middle of December until the middle of February


*HIF will announce more detailed information including homestay and tuition in early December.
*Due to the progression of COVID, all information is considered tentative and subject to change.